COMPANY

History

1969 Rodel Inc. was founded in Newark, Delaware, USA.
1983 Rodel Nitta was founded by the investment between Nitta Corporation and Rodel Inc.
1984 Started distribution of Nalco slurry(via Rodel Inc.) and Rodel SUBA™ series pad.
Started TA production
1988 By the technology introduction, production of polishing pad, SUBA™ Pad started
1989 Production of MH™ series pad started using our proprietary technology
Rodel Inc. started to supply polishing system to CMP field
1992 Production of backing material R300 series started with our proprietary technology.
1993 Started to supply polishing system to the device maker in Japan
1995 Rodel Inc. was registered for ISO 9001
By the technology introduction, constructed the slurry production plant(mainly CMP slurries) in Mie
1996 Mie plant completed
1997 Started the production of slurries for CMP field
Rodel Nitta was registered for ISO 9001
1998 Started the production of pads(IC1000™) for CMP field
2000 Rodel Particles, Inc. was founded
2001 Rodel Nitta was registered for ISO 14001
Started the production of Nanopure™ series polishing slurries
2004 The company name has been changed to Nitta Haas Incorporated
Started to supply VISIONPAD™ series polishing pads which are Dow’s product
2005 Kyoto plant completed
2006 Moved from Nara plant to Kyoto plant
2007 Tokyo branch (Nitta Building) remodeled
2012 Established NITTA HAAS R&D Annex as a research lab within Pusan National University, South Korea
2013 Started to supply IKONIC™ series polishing pads which are Dow’s product